英语翻译Polymer film rupturing in comparison with levelingand dewettingAbstractThe break up of a thin polystyrene (PS) film applied on silicon (Si) upon heating above the bulk glass transitiontemperature (Tg) of the polymer is studied using atomi

英语翻译Polymer film rupturing in comparison with levelingand dewettingAbstractThe break up of a thin polystyrene (PS) film applied on silicon (Si) upon heating above the bulk glass transitiontemperature (Tg) of the polymer is studied using atomi
英语翻译
Polymer film rupturing in comparison with leveling
and dewetting
Abstract
The break up of a thin polystyrene (PS) film applied on silicon (Si) upon heating above the bulk glass transition
temperature (Tg) of the polymer is studied using atomic force microscopy (AFM).In a 17-nm thick PS film rupturing
occurs with the formation of indent-like surface disturbances pointing toward the Si substrate and leads to the standard
nucleated dewetting process.Indent growth toward the substrate is accompanied by an increase of the indent radius at
the level of the free,unperturbed,PS surface and a decrease of the radius of curvature at the indent bottom.The two
radii are comparable and are 1–3 orders of magnitude larger than the film thickness.The area induced in the system
upon indent formation was measured for several indents and found to be almost negligible comparing to the total area
of the system.Rupturing (growing indents) is discussed with respect to the opposing leveling (healing indents) process
of artificially induced indents.Also,a comparison of the indent growth rate toward the substrate,calculated using previously
published data,with the dewetting rate of an expanded dry patch along the substrate is provided,which suggests
that the former is about 2–3 orders of magnitude lower than the latter.
\1 2005 Elsevier B.V.All rights reserved.
Keywords:Wetting; Surface energy; Surface defects; Surface relaxation and reconstruction; Surface roughening; Silicon; Atomic force
microscopy
1.Introduction

英语翻译Polymer film rupturing in comparison with levelingand dewettingAbstractThe break up of a thin polystyrene (PS) film applied on silicon (Si) upon heating above the bulk glass transitiontemperature (Tg) of the polymer is studied using atomi
聚合体电影破裂和消除比较起来
而且 dewetting
摘要
那一个瘦的聚苯乙烯 (PS) 一加热在大量的玻璃转变上面在矽 (Si) 上被应用的电影瓦解
聚合体的温度 (Tg) 被学习使用原子的力量显微镜使用 (AFM) . 在一 17- nm 厚的 PS 电影破裂
以像契约一样表面扰乱的形成发生向对标准的 Si 基体和领引指出
有核的 dewetting 处理. 契约向基体的生长由契约半径的增加陪同在
自由的,未受到搅乱者的水平,表面的 PS 和在契约底部的屈曲半径的一个减少. 那二
半径是可比较的并且是 1 –比电影厚度大的大小 3个次序. 区域在系统中感应
在契约形成之上对于一些契约被测量并且发现是到总面积的几乎可以忽略比较
系统. 使被有关于那反对讨论消除 (痊愈契约) 程序破裂 (成长的契约)
人工地感应契约. 同时, 向基体的契约成长率的一个比较, 计算先前使用
出版了数据, 藉由 dewetting 率一沿着基体扩大干的片被提供, 这建议
那先前者是大约 2 –大小的 3个次序比后者低的.
\1 2005 Elsevier B.V. 版权所有.
牛鼻子字: 变湿; 升至水面能源; 升至水面缺点; 升至水面松弛和重建; 表面弄粗弄崎岖不平; 矽; 原子的力量
显微镜使用
1. 介绍

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